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The researchers estimate the period from 2023 to 2028. EUV lithography will address the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the manufacture of advanced microchips with greater transistor densities....
Scientists from the University of Hahn in Spain and the University of Santiago de Compostela conducted research to determine the most suitable semiconductor materials for high-power light transmission in terrestrial and underwater environments.HPOT, also known as laser power transfer, is a method of transmitting continuous power to a remote system using a monochromatic light source through an opti...
The team from the School of Information and Communication Engineering at the University of Electronic Science and Technology of China has proposed for the first time a laser radar instrument based on the dispersion Fourier transform method, forming a new demodulation mechanism. This instrument breaks through the cross limitations of measurement speed, accuracy, and distance, and has unique advanta...
On December 11th local time, New York State announced a partnership with companies such as IBM, Micron, Applied Materials, and Tokyo Electronics to jointly invest $10 billion to expand the Albany NanoTech Complex in New York State, ultimately transforming it into a high numerical aperture extreme ultraviolet (NA EUV) lithography center to support the development of the world's most complex and pow...
Lumentum, a leading designer and manufacturer of innovative optical and photonic products, has announced that it has completed the acquisition of a site in Caswell, UK.Lumentum revealed that it has made significant investments in the site over the past two years and is currently undergoing development upgrades for its state-of-the-art cleanrooms and laboratories to continue to support the developm...