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Recently, the research team of the High Power Laser Element Technology and Engineering Department of the Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, has made new progress in evaluating the laser damage resistance and damage mechanism of 532nm thin film polarizers using different laser damage test protocols. The related achievements were published in Optical Materi...
A group of network, semiconductor, and optical companies formed the LPO MSA to develop the network equipment and optical module specifications required to implement a wide ecosystem of interoperable LPO solutions.These specifications address the industry challenges of reducing power consumption, cost, and latency while improving the reliability of high-speed optical interconnections.Accelink, AMD...
A research team in France has reported a novel laser that emits light in the orange region of the spectrum, indicating its potential applications in flow cytometry and astronomical laser guidance.In the research results just published in Optics Express, the team (including researchers from the É cole Polytechnique in Caen, France and Oxxius, a laser manufacturer based in Lannion) claimed that the ...
Scientists from Heriot Watt University in Edinburgh, Scotland have discovered a powerful new method for programming optical circuits, which is crucial for the delivery of future technologies such as unbreakable communication networks and ultrafast quantum computers."Light can carry a large amount of information, and optical circuits that use light instead of electricity are seen as the next majo...
LLNL has long been a pioneer in the development of EUV lithography technology.A laboratory located in California will lay the foundation for the next development of extreme ultraviolet (EUV) lithography technology. The project is led by Lawrence Livermore National Laboratory (LLNL) and aims to promote the next development of EUV lithography technology, centered around the laboratory's developed dr...