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Recently, Laser Photonics Corp. (LPC), a Nasdaq listed equipment developer, announced that it has appointed John T. Armstrong as its new Executive Vice President. Before assuming his position at LPC, Armstrong served as Vice President of Astronics Test Systems, a subsidiary of Astronics Corporation, a global leader in advanced technology and products in critical mission areas such as aerospace a...
The Chinese Academy of Sciences reduced the volume of the deep ultraviolet laser by 90% and achieved 193 nm vortex beam output for the first time. Professor Xuan Hongwen described "loading truck equipment into the car trunk". This technology enables a 30% reduction in the size of lithography features, breaking through the bottleneck of the 2-nanometer process. In the next three years, laser power ...
LLNL has long been a pioneer in the development of EUV lithography technology.A laboratory located in California will lay the foundation for the next development of extreme ultraviolet (EUV) lithography technology. The project is led by Lawrence Livermore National Laboratory (LLNL) and aims to promote the next development of EUV lithography technology, centered around the laboratory's developed dr...
Summary:To filter out infrared light from the driving light source in the extreme ultraviolet lithography (EUVL) light source system, a rectangular grating structure needs to be fabricated on the surface of the collection mirror. However, the collection mirror grating usually undergoes deformation during the manufacturing process, resulting in a decrease in filtering efficiency. The process errors...
Grenoble stated that in the context of growing demand driven by artificial intelligence and 5G, "key" milestones have strengthened its supply chain.Scantil Photonics, a subsidiary of CEA Leti that focuses on silicon photonics, has stated that its integrated laser design is now being produced by Tower Semiconductor, a wafer foundry partner.This method describes this development as a "crucial step f...