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The researchers estimate the period from 2023 to 2028. EUV lithography will address the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the manufacture of advanced microchips with greater transistor densities....
Recently, according to a paper published in Nature Communications titled "Phonoenhanced nonlinearities in hexagonal boron nitride," engineers from Columbia University collaborated with theoretical experts from the Max Planck Institute of Material Structure and Dynamics to discover that pairing lasers with lattice vibrations can improve the nonlinear optical properties of layered two-dimensional ma...
TAU Systems, a manufacturer of ultra fast compact laser plasma accelerators, announced today that it has successfully upgraded the existing desktop terawatt laser (UT 3) at the University of Texas to a new and improved performance that provides power for compact particle accelerators. The upgraded UT 3 driver laser can now generate ultra short pulses with a peak power of 40 terawatts.This upgrade ...
Recently, the team of Situ Guohai and Guo Jinying from the Aerospace Laser Technology and Systems Department of the Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, and the School of Microelectronics at Shanghai University collaborated to propose a terahertz phase controlled programmable metasurface design scheme based on free carrier plasma dispersion effect. The rela...
Recently, the Los Alamos National Laboratory (LANL) in the United States has developed a method for quantum light emitters, which stacks two different atomic thin materials together to achieve a light source that generates circularly polarized single photon streams. These light sources can also be used for various quantum information and communication applications.According to Han Htoon, a researc...