- 데이터 없음
한국어
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
The team from the School of Information and Communication Engineering at the University of Electronic Science and Technology of China has proposed for the first time a laser radar instrument based on the dispersion Fourier transform method, forming a new demodulation mechanism. This instrument breaks through the cross limitations of measurement speed, accuracy, and distance, and has unique advanta...
On December 11th local time, New York State announced a partnership with companies such as IBM, Micron, Applied Materials, and Tokyo Electronics to jointly invest $10 billion to expand the Albany NanoTech Complex in New York State, ultimately transforming it into a high numerical aperture extreme ultraviolet (NA EUV) lithography center to support the development of the world's most complex and pow...
Recently, the research team of the Aerospace Laser Technology and System Department of the Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, proposed a torsional Sagnac interferometer and applied it to the fiber laser system, realizing mode locking self starting and pulse shaping. The relevant research achievements were published in the Journal of Lightwave Technology u...
It is reported that researchers from the University of Waterloo in Canada have reported a study on the plasticity of copper oxide nanowires induced by femtosecond laser. The related research was published in Applied Surface Science under the title "Femtosecond laser induced plasticity in CuO nanowires".Metal oxide nanowires are ideal materials for manufacturing nanodevices, especially strain senso...
EV Group, a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology, and semiconductor markets, and Silicon Austria Labs, a leading electronic systems research center in Austria, announced that SAL has received and installed multiple EVG lithography and photoresist processing systems in its MicroFab at the R&D cleanroom facility in Filach, Austria.These devices...