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The Chinese Academy of Sciences reduced the volume of the deep ultraviolet laser by 90% and achieved 193 nm vortex beam output for the first time. Professor Xuan Hongwen described "loading truck equipment into the car trunk". This technology enables a 30% reduction in the size of lithography features, breaking through the bottleneck of the 2-nanometer process. In the next three years, laser power ...
Recently, the team of Professor Sun Jinhua and researcher Wang Qingsong of the University of Science and Technology of China and the team of Professor Guo Tuan of Jinan University have made important achievements in the field of early warning of thermal runaway optical fiber detection of lithium-ion batteries.A high-precision, multi-mode integrated fiber optic device that can be implanted in...
Recently, a Japanese research team has developed a vertical deep ultraviolet emitting semiconductor laser device based on AlGaN, which is expected to be applied in laser processing, biotechnology, and medical fields.As is well known, ultraviolet (UV) is an electromagnetic wave with a wavelength range of 100 to 380nm. These wavelengths can be divided into three regions: UV-A (315-380 nm), UV-B (280...
Lithography is one of the core processes in semiconductor manufacturing, and extreme ultraviolet lithography technology, as a new generation lithography technology, is also in a rapid development stage. The basic principle is to use photoresist (also known as photoresist) to form corrosion resistance due to photochemical reactions after being photosensitive, and to engrave the patterns on the mask...
Recently, Dong Yibo, from the Photonic Chip Research Institute of Shanghai University of Technology, published his research findings titled "Nanoprinted Diffractive Layer Integrated Vertical Cavity Surface Emitting Vortex Lasers with Scalable Topological Charge" as the first author in the internationally renowned journal Nano Letters.This achievement was jointly completed by the team of academicia...