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Recently, the semiconductor industry has adopted Extreme Ultraviolet Lithography (EUVL) technology. This cutting-edge photolithography technology is used for the continuous miniaturization of semiconductor devices to comply with Moore's Law. Extreme ultraviolet lithography (EUVL) has become a key technology that utilizes shorter wavelengths to achieve nanoscale feature sizes with higher accuracy a...
The team from the School of Information and Communication Engineering at the University of Electronic Science and Technology of China has proposed for the first time a laser radar instrument based on the dispersion Fourier transform method, forming a new demodulation mechanism. This instrument breaks through the cross limitations of measurement speed, accuracy, and distance, and has unique advanta...
According to Korean media reports, Intel has acquired most of the high numerical aperture (NA) extreme ultraviolet (EUV) lithography equipment manufactured by ASML in the first half of next year.ASML plans to produce 5 high NA EUV lithography equipment this year, all of which will be supplied to Intel.They stated that ASML has an annual production capacity of approximately 5-6 High Numerical Apert...
This month, German laser giant Trumpf completed an expansion project at its smart factory in Pasing, Austria. The opening ceremony was held in the presence of members of the Tongkuai Group family and representatives from the business and political circles. Over the past two years, Tongkuai has invested approximately 40 million euros in the expansion of the factory. The company has built two new...
A muffler is a key component of a car's exhaust system, designed to reduce noise levels and emissions. The vibration of a muffler can have a significant impact on its performance and life. In order to understand the performance and behavior of the muffler, it is necessary to make multi-point vibration measurement. First, it enables engineers to assess the structural integrity and durability of a m...