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Modern laser technology urgently requires nonlinear optical materials that can generate coherent light through second harmonic generation. However, only a small portion of the nonlinear optical properties of non centrosymmetric crystal materials have been experimentally or theoretically studied, and exploration for high-performance nonlinear optical crystal materials is still very limited.Recentl...
According to Korean media reports, Intel has acquired most of the high numerical aperture (NA) extreme ultraviolet (EUV) lithography equipment manufactured by ASML in the first half of next year.ASML plans to produce 5 high NA EUV lithography equipment this year, all of which will be supplied to Intel.They stated that ASML has an annual production capacity of approximately 5-6 High Numerical Apert...
Semiconductor quantum dots have the advantages of high quantum yield, narrow emission spectrum, and compatibility with solution processes. They have shown broad application prospects and enormous economic value in the field of optoelectronic materials and devices, and related research has won the Nobel Prize in Chemistry in 2023.Compared with traditional II-VI and III-V quantum dots (such as CdSe,...
Develop and research a new downhole bubble point pressure measurement technology suitable for black oil and volatile oil to enhance well analysis using spectroscopy.Representative fluid characteristics are required for a wide range of oilfield lifespans, such as the initial scale and production planning of reservoir hydrocarbon reserves. Fluid characteristics are usually obtained from laboratory s...
The researchers estimate the period from 2023 to 2028. EUV lithography will address the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the manufacture of advanced microchips with greater transistor densities....