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Lithography is one of the core processes in semiconductor manufacturing, and extreme ultraviolet lithography technology, as a new generation lithography technology, is also in a rapid development stage. The basic principle is to use photoresist (also known as photoresist) to form corrosion resistance due to photochemical reactions after being photosensitive, and to engrave the patterns on the mask...
The fully dielectric element surface has the characteristics of low material loss and strong field localization, making it very suitable for manipulating electromagnetic waves at the nanoscale. Especially the surface of all silicon dielectric elements can achieve ideal compatibility with complementary metal oxide semiconductor technology, making it an ideal choice for large-scale monolithic integr...
High brightness semiconductor lasers have extremely important applications in fields such as laser radar. Traditional semiconductor lasers face challenges such as large vertical divergence angle, elliptical beam output, multiple lateral modes, and poor beam quality, which limit the direct application of high brightness semiconductor lasers.In response to this challenge, the team from the Bimberg S...
Advanced laser and plasma solution provider E&R Engineering Corp. has confirmed that they will participate in the Semiconductor SEA 2024 event held in Kuala Lumpur, Malaysia. With 30 years of focus in the semiconductor industry, E&R has developed a wide range of plasma and laser technologies. At Semicon SEA 2024, they will showcase their latest solutions, including:Plasma Cutting - Small M...
Typically, for lasers in optical communication systems, waveguide designs are used to achieve a single transverse mode. By adjusting the thickness of the surrounding area of the cladding layer and the etching depth of the ridge in the ridge waveguide device, a single mode device can be obtained. The importance of lasers is reflected in the following aspects:A chip without ridge waveguide design an...