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Chip level ultrafast mode-locked laser based on nanophotonic lithium niobate.Researchers have created a compact mode-locked laser integrated into a nanophotonic platform, capable of generating high-power and ultrafast optical pulses. The breakthrough in miniaturization of MLL technology can significantly expand the application of photonics.Innovation in mode-locked laser technologyTo improve the t...
LLNL has long been a pioneer in the development of EUV lithography technology.A laboratory located in California will lay the foundation for the next development of extreme ultraviolet (EUV) lithography technology. The project is led by Lawrence Livermore National Laboratory (LLNL) and aims to promote the next development of EUV lithography technology, centered around the laboratory's developed dr...
Scientists from the Institute of Automation and Control Process at the Far East Branch of the Russian Academy of Sciences described the changes on the surface of monocrystalline silicon during laser processing. The author of this study placed the crystal in a methanol solution and applied a laser pulse lasting one thousandth of a second to the sample, with a pulse count ranging from five to fifty ...
On August 14th local time, Veeco Instruments, a well-known American laser annealing manufacturer, announced an important cooperation with technology giant IBM. It is reported that IBM has selected Veeco Instruments' WaferStorm wet processing system as support for its advanced packaging applications, and the two parties have signed a joint development agreement to explore the potential of utilizi...
authorElsa Lani, Aloka SinhaabstractAt present, the progress in developing new liquid crystal materials for next-generation applications mainly focuses on improving the physical properties of liquid crystal systems.Recent research progress has shown that functionalized nanoparticles embedded in LC matrix can significantly alter the properties of LC materials based on the interaction between host m...