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Recently, according to Tom's Hardware, Lawrence Livermore National Laboratory (LLNL) in the United States is developing a PW (1015 W) level large aperture thulium (BAT) laser. It is reported that this laser has the ability to increase the efficiency of extreme ultraviolet lithography (EUV) light sources by about 10 times, and may potentially replace the carbon dioxide laser used in current EUV too...
As a promising imaging modality that combines the high spatial resolution of optical imaging and the deep tissue penetration ability of ultrasound imaging, photoacoustic microscopy (PAM) has attracted a lot of attention in the field of biomedical research, and has a wide range of applications in many fields, such as tumor detection, dermatology, and vascular morphology assessment. Depending on the...
EV Group, a leading supplier of wafer bonding and lithography equipment in the MEMS, nanotechnology, and semiconductor markets, yesterday launched the EVG850 NanoClean layer release system, which is the first product platform to adopt EVG's revolutionary NanoClean technology.The EVG850 NanoClean system combines infrared lasers with specially formulated inorganic release materials, and can ...
Thermowood has developed a large-scale additive and subtractive material manufacturing equipment, LSAM, and successfully printed tooling molds on site that can be used for aerospace composite material forming, demonstrating its low-cost and rapid response to composite material manufacturing capabilities to the public.As a large-scale component additive manufacturer, Thermowood has developed a near...
Dr. Tan Chaolin from the Singapore Institute of Manufacturing Technology, in collaboration with China University of Petroleum, Shanghai Jiao Tong University, Princeton University, University of Malta, Huazhong University of Science and Technology (Professor Zhang Haiou), University of California, Irvine, Hunan University, and EPM Consulting, published an article titled "Review on Field Assisted Me...