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Recently, a team led by Gao Chunqing and Fu Shiyao from the School of Optoelectronics at Beijing University of Technology combined optical spatial coordinate transformation with photon spin Hall effect to construct a photon angular momentum filter for the first time internationally, achieving on-demand regulation of photon spin angular momentum and orbital angular momentum.The related achievements...
Recently, according to Tom's Hardware, Lawrence Livermore National Laboratory (LLNL) in the United States is developing a PW (1015 W) level large aperture thulium (BAT) laser. It is reported that this laser has the ability to increase the efficiency of extreme ultraviolet lithography (EUV) light sources by about 10 times, and may potentially replace the carbon dioxide laser used in current EUV too...
Recently, the semiconductor industry has adopted Extreme Ultraviolet Lithography (EUVL) technology. This cutting-edge photolithography technology is used for the continuous miniaturization of semiconductor devices to comply with Moore's Law. Extreme ultraviolet lithography (EUVL) has become a key technology that utilizes shorter wavelengths to achieve nanoscale feature sizes with higher accuracy a...
Recently, South Korean listed company APS has invested in Blue Tile Lab, a company engaged in semiconductor backend process visual inspection and laser light sources. Meanwhile, D&T, a subsidiary of APS specializing in the production of laser cutting equipment for secondary batteries, has also made its first investment in Blue Tile Lab.According to relevant information, APS made its first inve...
The widespread application in the fields of optical communication, computing, and sensing continues to drive the growing demand for high-performance integrated photonic components. Recently, Ali Najjar Amiri of Kochi University in Türkiye and other scholars proposed a highly scalable and highly flexible deep photonic network platform, which is used to realize optical systems on chip with arbi...