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The research team used a new reverse design framework to demonstrate ultra optical broadband thermal imaging for applications ranging from consumer electronics to thermal sensing and night vision.The new framework, known as the "Modulation Transfer Function" project, solves the challenges related to broadband metaoptics by determining the functional relationship between image contrast and spatial ...
Recently, the semiconductor industry has adopted Extreme Ultraviolet Lithography (EUVL) technology. This cutting-edge photolithography technology is used for the continuous miniaturization of semiconductor devices to comply with Moore's Law. Extreme ultraviolet lithography (EUVL) has become a key technology that utilizes shorter wavelengths to achieve nanoscale feature sizes with higher accuracy a...
Recently, the Xi'an Institute of Optics and Fine Mechanics of the Chinese Academy of Sciences has made significant progress in attosecond imaging research, achieving high-resolution imaging of ultra wide spectrum light sources. The related results were published in the journal Photonics Research under the title "Snapshot coherent diffraction imaging across ultra wideband spectra".Figure 1. Demonst...
Laser and electro-optic product manufacturer and supplier Xinyuan Technology announced today that it plans to participate in the 2024 Western Optoelectronics Show in San Francisco from January 30th to February 1st.As a top event in the photonics industry, the Western Optoelectronics Show in the United States will return in 2024 to host another groundbreaking exhibition. This annual event att...
The Chinese Academy of Sciences reduced the volume of the deep ultraviolet laser by 90% and achieved 193 nm vortex beam output for the first time. Professor Xuan Hongwen described "loading truck equipment into the car trunk". This technology enables a 30% reduction in the size of lithography features, breaking through the bottleneck of the 2-nanometer process. In the next three years, laser power ...