- Không có dữ liệu
Tiếng Việt
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
OpenLight Photonics, the developer of photonic application-specific integrated circuit (PASIC) design tools established by software giant Synopsys, says it has raised $34 million in venture finance.The Santa Clara firm, whose process design kits (PDKs) support the integration of indium phosphide (InP) and silicon photonics components in complex layouts, says that the series A funding will see it r...
2Pi Optics has launched a new type of fisheye camera based on its so-called metasurface optics.The company plans to showcase this technology at the large-scale technology trade show CES 2024 in Las Vegas next week.This company, headquartered in Cambridge, Massachusetts, stated that it has created the world's leading high-resolution fisheye sensor based on optical superlens technology. This technol...
It is reported that researchers from the Technical University of Munich in Germany have reported a feasibility study on the composite manufacturing of EN AC-42000 alloy by combining laser powder bed melting and cold casting. The related research titled "Feasibility study on hybrid manufacturing combining laser based powder bed fusion and chill casting on the example of EN AC-42000 alloy" was publi...
This collaboration deeply integrates the unique expertise and cutting-edge technological achievements of both companies in the field of optoelectronics, aiming to broaden the boundaries of optoelectronics innovation.EPIGAP OSA Photonics GmbH, as a leader in the research and manufacturing of optoelectronic components in Germany, is deeply rooted in multiple fields such as medical technology, indust...
Recently, according to Tom's Hardware, Lawrence Livermore National Laboratory (LLNL) in the United States is developing a PW (1015 W) level large aperture thulium (BAT) laser. It is reported that this laser has the ability to increase the efficiency of extreme ultraviolet lithography (EUV) light sources by about 10 times, and may potentially replace the carbon dioxide laser used in current EUV too...