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According to Korean media reports, Intel has acquired most of the high numerical aperture (NA) extreme ultraviolet (EUV) lithography equipment manufactured by ASML in the first half of next year.ASML plans to produce 5 high NA EUV lithography equipment this year, all of which will be supplied to Intel.They stated that ASML has an annual production capacity of approximately 5-6 High Numerical Apert...
Researchers have made breakthrough discoveries in the field of nanophotonics. They have successfully developed a locked mode ultrafast laser using lithium niobium, a material known for its excellent optical properties. This breakthrough opens up new possibilities for revolutionary applications, including telecommunications, data storage, and ultra fast imaging.A mode-locked laser is a type of lase...
In November 2024, based on the mutual trust and cooperation over the past years, the Munich Shanghai Optical Expo and the Light Academic Publishing Center of the Changchun Institute of Optics, Precision Mechanics and Physics, Chinese Academy of Sciences (hereinafter referred to as the "Light Center") reached a consensus on further strategic development as they ushered in the year of disruptive sci...
Recently, IPG Photonics, a high-performance fiber laser supplier in the United States, released its first quarter financial report as of March 31, 2024.The financial report shows that IPG Photonics revenue in the first quarter was 252 million US dollars, a year-on-year decrease of 27%; The net profit was 19 million US dollars, a year-on-year decrease of 75%. The change in foreign exchange rate res...
Summary:To filter out infrared light from the driving light source in the extreme ultraviolet lithography (EUVL) light source system, a rectangular grating structure needs to be fabricated on the surface of the collection mirror. However, the collection mirror grating usually undergoes deformation during the manufacturing process, resulting in a decrease in filtering efficiency. The process errors...