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The researchers estimate the period from 2023 to 2028. EUV lithography will address the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the manufacture of advanced microchips with greater transistor densities....
Recently, the research team of the High Power Laser Physics Joint Laboratory of the Chinese Academy of Sciences Shanghai Institute of Optics and Fine Mechanics identified and analyzed the abnormal near-field output of the SG - Ⅱ upgrade device by using the spatial domain computing method and the deep learning model with attention mechanism in response to the requirements of real-time and effective...
Recently, the Aerospace Laser Technology and System Department of the Shanghai Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, and the East China Research Team of the Key Laboratory of Quantum Optics, Chinese Academy of Sciences, together with the research team of Professor Chen Liqing of East China Normal University, demonstrated a Rydberg microwave sensor with high sens...
Recently, the Fraunhofer Institute (HHI) has developed a technology for processing aluminum alloy materials using reactive gas assisted nanosecond lasers, which can be used to produce electronic box samples for spacecraft manufacturing. This development project is part of the NanoBLAST project, in close collaboration with thermal engineering company Azimut Space GmbH, aimed at manufacturing surfac...
Recently, EO Technologies, a well-known semiconductor laser processing equipment manufacturer in South Korea, is emerging in the glass substrate processing market.It is understood that EO Technologies is entering the glass substrate TGV market based on its UV laser drilling equipment originally used in PCB substrate technology. TGV technology is the core process for drilling holes inside glass sub...