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The researchers estimate the period from 2023 to 2028. EUV lithography will address the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the manufacture of advanced microchips with greater transistor densities....
Advanced laser and plasma solution provider E&R Engineering Corp. has confirmed that they will participate in the Semiconductor SEA 2024 event held in Kuala Lumpur, Malaysia. With 30 years of focus in the semiconductor industry, E&R has developed a wide range of plasma and laser technologies. At Semicon SEA 2024, they will showcase their latest solutions, including:Plasma Cutting - Small M...
The fully dielectric element surface has the characteristics of low material loss and strong field localization, making it very suitable for manipulating electromagnetic waves at the nanoscale. Especially the surface of all silicon dielectric elements can achieve ideal compatibility with complementary metal oxide semiconductor technology, making it an ideal choice for large-scale monolithic integr...
Recently, scientists used laser gyroscopes to measure that the change in Earth's rotational speed is less than one millionth. This technology can help scientists understand the complex flow of water and air, which can cause the smallest adjustments to the Earth's rotation.The Earth's rotation is not completely stable. Planets accelerate or slow down as they rotate, slightly shortening or prolongin...
It is reported that recently researchers from the Chinese Academy of Sciences have achieved the highest power output of 193 nm and 221 nm lasers using lithium borate (LBO) crystals. This achievement lays the foundation for the further application of the laser in deep ultraviolet (DUV) spectroscopy.The laser in DUV spectroscopy has many applications in science and technology, such as defect detecti...