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Lawrence Livermore National Laboratory develops PW grade thulium laser in the United States

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2025-02-13 14:53:25
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Recently, according to Tom's Hardware, Lawrence Livermore National Laboratory (LLNL) in the United States is developing a PW (1015 W) level large aperture thulium (BAT) laser. It is reported that this laser has the ability to increase the efficiency of extreme ultraviolet lithography (EUV) light sources by about 10 times, and may potentially replace the carbon dioxide laser used in current EUV tools. Currently, LLNL's research indicates that the operating wavelength of BAT lasers can achieve higher plasma to EUV conversion efficiency. In addition, compared to gas based carbon dioxide laser devices, the diode pumped solid-state technology used in BAT systems can provide better overall electrical efficiency and thermal management. This means that implementing BAT technology in semiconductor production is expected to reduce a significant amount of energy consumption.



Source: Yangtze River Delta Laser Alliance

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