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The researchers estimate the period from 2023 to 2028. EUV lithography will address the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the manufacture of advanced microchips with greater transistor densities....
Recently, Fabrinet released its financial report for the three months ended December 27, 2024, showing that its sales and revenue exceeded expectations. During the reporting period, the company achieved sales of $834 million, a year-on-year increase of 17%. Net income increased by 25% during the same period, reaching $86.6 million.Although the growth in performance is still dominated by the optica...
According to Korean media reports, Intel has acquired most of the high numerical aperture (NA) extreme ultraviolet (EUV) lithography equipment manufactured by ASML in the first half of next year.ASML plans to produce 5 high NA EUV lithography equipment this year, all of which will be supplied to Intel.They stated that ASML has an annual production capacity of approximately 5-6 High Numerical Apert...
With the development of cutting-edge technologies such as automatic guidance and embodied intelligence, machine vision has put forward higher requirements for image acquisition, requiring precise recording of static images and the ability to sensitively capture dynamic changes in the scene. The existing dynamic and active pixel sensor technology integrates two functions: dynamic event detection an...
Recently, the Xi'an Institute of Optics and Fine Mechanics of the Chinese Academy of Sciences has made significant progress in attosecond imaging research, achieving high-resolution imaging of ultra wide spectrum light sources. The related results were published in the journal Photonics Research under the title "Snapshot coherent diffraction imaging across ultra wideband spectra".Figure 1. Demonst...