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Chip giant Intel announced that it has completed the assembly work of the world's first commercial high numerical aperture (NA) extreme ultraviolet lithography (EUV) scanner. This device greatly improves the resolution and feature scaling of next-generation chips by changing the optical design used to project printed images onto silicon wafers.This lithography equipment weighing 150 tons has been ...
Recently, the research team of the High Power Laser Physics Joint Laboratory of the Chinese Academy of Sciences Shanghai Institute of Optics and Fine Mechanics identified and analyzed the abnormal near-field output of the SG - Ⅱ upgrade device by using the spatial domain computing method and the deep learning model with attention mechanism in response to the requirements of real-time and effective...
Optical equipment is an integral part of technologies such as data centers and autonomous vehicle, which are constantly developing to meet the needs of complex applications. The challenge faced by designers is to manipulate light at the wavelength scale to achieve the required optical properties, which requires precision at both the nano and macro scales. Nanoscale structures, such as those on LED...
Scientists from Leibniz University in Hanover have pioneered the development of a new manufacturing technology - UV LED based microscopy projection lithography. This technology is expected to completely change the manufacturing method of optical components, providing high resolution at lower cost and ease of use. The MPP system utilizes the power of UV LED light sources to transcribe the structura...
Terahertz waves have significant application value in communication and imaging. The nonlinear interaction between strong field ultrafast laser and matter is one of the important ways to generate terahertz waves. The experimental and theoretical research related to terahertz generation media such as plasma, gas, and crystal is relatively sufficient. However, liquid water is a strong absorbing medi...