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Summary:To filter out infrared light from the driving light source in the extreme ultraviolet lithography (EUVL) light source system, a rectangular grating structure needs to be fabricated on the surface of the collection mirror. However, the collection mirror grating usually undergoes deformation during the manufacturing process, resulting in a decrease in filtering efficiency. The process errors...
The researchers estimate the period from 2023 to 2028. EUV lithography will address the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the manufacture of advanced microchips with greater transistor densities....
Recently, BluGlass, a leading global semiconductor development company, successfully completed its stock purchase plan (SPP) and raised $5.87 million in funds (excluding costs). This SPP provides eligible shareholders with the opportunity to subscribe to up to $100000 in new shares of BluGlass at a discounted price of $0.037 per share, along with free additional options. This initiative has gained...
Recently, laser cleaning equipment manufacturer Laser Photonics Corporation (LPC) has disclosed multiple orders in a row.On December 26th, LPC received an order from Walsh Service Solutions to purchase a handheld laser cleaning equipment. It is understood that the manufacturer is purchasing CleanTech IR-3040, a high-performance handheld fiber laser cleaning device designed by LPC, mainly used for ...
Recently, French silicon photonics company Scintil Photonics announced an exciting collaboration, successfully integrating III-V-DFB lasers and amplifiers with standard silicon photonics technology in the production of Israeli semiconductor company Tower Semiconductor. This milestone collaboration marks a crucial step for Scintil in strengthening its supply chain, bringing new possibilities to com...