Nederlands

The researchers expect the EUV lithography market to grow from $9.4 billion in 2023 to $25.3 billion in 2028

654
2023-08-04 16:47:18
Bekijk vertaling

The researchers estimate the period from 2023 to 2028. EUV lithography will address the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the manufacture of advanced microchips with greater transistor densities.

The key component of EUV lithography is the EUV light source, which involves generating and manipulating 13.5 nm of high-energy light. This is done by using lasers to generate plasma from tin droplets, which emit extreme ultraviolet radiation. The EUV light is then reflected and focused using a series of precisely designed mirrors, transferring the desired pattern onto a silicon wafer coated with a light-sensitive material called a photoresist.

 

EUV lithography has several advantages over previous lithography techniques. First, it can significantly increase chip density, enabling the production of more powerful and complex ics.

 

Second, it simplifies the manufacturing process and increases production efficiency by reducing the number of steps required for pattern transfer. Finally, EUV lithography allows for better control of critical dimensions and reduced pattern variability, resulting in improved chip performance and yield.

 

EUV lithography plays a key role in the production of advanced ics for a variety of applications such as high-performance computing, artificial intelligence and mobile devices.

 

Foundries are expected to grow at the highest CAGR during the forecast period.

In the commercial sector, foundries are manufacturing plants that specialize in providing semiconductor manufacturing services to semiconductor companies and integrated device manufacturers (IDMs). Foundries are primarily focused on manufacturing processes for the semiconductor industry and do not engage in chip design.

 

Foundries play a vital role in the semiconductor industry by providing manufacturing services to companies that lack their own manufacturing facilities or choose to outsource chip production.

 

Fabless companies and ID work with foundries to transfer their chip designs, known as intellectual property (IP), to foundries for manufacturing. Well-known foundries that provide semiconductor manufacturing services including EUV lithography include companies such as TSMC, GlobalFoundries, Samsung Foundries, and others.

 

The growth of foundry companies can be attributed to their substantial investments in EUV lithography, with Asia-Pacific countries being the main contributors to the expansion and advancement of the EUV lithography market.

 

During the forecast period, the EUV mask segment is expected to grow at the second highest CAGR in the EUV lithography equipment market.

 

EUV masks, also known as EUV masks or EUV photomask, play a crucial role in an advanced lithography process called extreme ultraviolet lithography (EUVL). EUV lithography is a state-of-the-art technology for manufacturing the next generation of next-generation semiconductor devices characterized by smaller feature sizes and enhanced performance.

 

EUV masks help to pattern integrated circuits on semiconductor wafers by containing circuit patterns projected onto the wafer during the photolithography process. Unlike traditional optical masks used in older lithography techniques, EUV masks are specifically designed to function in ultraviolet light at wavelengths of about 13.5 nanometers. They consist of thin substrates coated with multiple layers of reflective material that help to reflect and focus EUV light onto the wafer, enabling precise and high-resolution patterning. The complex structure of the EUV mask involves advanced manufacturing techniques and strict quality control measures to ensure the accuracy and reliability of the circuit pattern. Several companies are involved in the manufacture of EUV masks and related products,

The Asia Pacific region is expected to grow at the highest CAGR during the forecast period.

 

Taiwan is home to leading semiconductor companies such as Taiwan Semiconductor Manufacturing Company (TSMC), the world's largest dedicated semiconductor foundry. TSMC has been at the forefront of adopting and advancing EUV lithography technology to be able to produce advanced chip sizes with smaller sizes and higher performance.

 

The company has made significant investments in EUV infrastructure and has been instrumental in driving the development and commercialization of EUV lithography systems. With its strong semiconductor ecosystem and commitment to technological innovation, Taiwan plays a vital role in increasing the capability and widespread adoption of EUV lithography in the semiconductor industry.

 

Some companies are innovating in EUV lithography technologies and systems. For example, in August 2020, TSMC developed the world's first environmentally friendly dry cleaning technology for EUV light hoods, designed to replace traditional cleaning processes.

 

Source: Laser Network

Gerelateerde aanbevelingen
  • The new Casiris H6 4K UST tricolor laser projector is about to be launched through Indiegogo

    Casir is about to launch the H6 4K UST tricolor laser projector through Indiegogo. The new laser projector has a brightness of up to 3000 ANSI lumens and a BT.2020 color gamut coverage of 110%. It is an ultra short focus projector that runs on Android TV.The Casiris H6 4K UST tricolor laser projector is a brighter and more accurate version of the Casiris A6. It also has greater image projection ca...

    2023-09-18
    Bekijk vertaling
  • Ring Laser Accuracy: Unprecedented Daily Measurement and Mapping of Earth's Rotation

    Scientists at the Technical University of Munich have made significant progress in measuring the Earth's rotation with unprecedented accuracy. Now, the ring laser from the Wettzell Geodetic Observatory can be used to capture data at a quality level unmatched anywhere in the world. These measurements are crucial for determining the position of the Earth in space, assisting climate research, and imp...

    2023-11-14
    Bekijk vertaling
  • Scientists have successfully miniaturized erbium-based erbium lasers on silicon nitride photonic chips

    Scientists from the Federal Institute of Technology in Lausanne (EPFL) have successfully miniaturized a powerful erbium-based erbium laser on silicon nitride photonic chips. Due to the large volume and difficulty in shrinking of typical erbium-based fiber lasers, this breakthrough is expected to make significant progress in optical communication and sensing technology.Since the 1960s, lasers have ...

    2024-06-13
    Bekijk vertaling
  • A review of research on residual stresses in carbon steel welding

    Researchers from the University of Witwatersrand in South Africa have reported a review of research on residual stresses in carbon steel welding: formation mechanisms, mitigation strategies, and advances in advanced post weld heat treatment technologies. The relevant paper titled "A comprehensive review of residual stresses in carbon steel welding: formation mechanisms, mitigation strategies, and ...

    04-12
    Bekijk vertaling
  • HP100A-50KW-GD laser power detector for measuring extremely high power laser beams

    The HP100A-50KW-GD laser power detector is mainly designed for manufacturers of high-power lasers and laser systems, factories that use high-power lasers to cut thick metal parts, and military applications.The HP100A-50KW-GD adopts a gold reflector cone and a reduced back reflection geometry, which can capture 97% of incident light and process up to 50 kW of continuous laser power. The back reflec...

    2024-01-16
    Bekijk vertaling