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Recently, Professor Tsumoru Shintake from Okinawa University of Science and Technology (OIST) proposed a revolutionary extreme ultraviolet (EUV) lithography technology that not only surpasses the boundaries of existing semiconductor manufacturing, but also heralds a new chapter in the industry's future.This innovation significantly improves stability and maintainability, as its simplified design o...
A new automated method for spectral background estimation in laser spectroscopy ensures the accuracy of quantitative analysis with minimal human intervention.When using laser-induced breakdown spectroscopy in spectral analysis, scientists may encounter various obstacles. The most common challenge faced by scientists when conducting elemental analysis is to optimize the interaction between the lase...
Recently, HüBNER Photonics, the leading manufacturer of high-performance lasers, has launched the latest member of the VALO femtosecond series - VALO Tidal. This laser not only represents a major leap in the fields of imaging, detection, and analysis, but also demonstrates the infinite possibilities of laser technology with its outstanding performance.The VALO Tidal femtosecond laser typically sho...
EV Group, a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology, and semiconductor markets, and Silicon Austria Labs, a leading electronic systems research center in Austria, announced that SAL has received and installed multiple EVG lithography and photoresist processing systems in its MicroFab at the R&D cleanroom facility in Filach, Austria.These devices...
Recently, the team led by Academician Guo Guangcan from the University of Science and Technology of China has made significant progress in the research of quantum elliptical polarization imaging. The research group of Professor Shi Baosen and Associate Professor Zhou Zhiyuan combined high-quality polarization entangled light sources with classical polarization imaging technology to observe the bir...