- Aucune donnée
Français
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
Recently, according to Tom's Hardware, Lawrence Livermore National Laboratory (LLNL) in the United States is developing a PW (1015 W) level large aperture thulium (BAT) laser. It is reported that this laser has the ability to increase the efficiency of extreme ultraviolet lithography (EUV) light sources by about 10 times, and may potentially replace the carbon dioxide laser used in current EUV too...
With the rapid development of modern electronic information technology, integrated circuit chip packaging forms are also emerging in an endless stream, and the package density is getting higher and higher, which greatly promotes the development of electronic products to multi-function, high performance, high reliability and low cost.So far, through hole technology (THT) and surface mount technolog...
Chip giant Intel announced that it has completed the assembly work of the world's first commercial high numerical aperture (NA) extreme ultraviolet lithography (EUV) scanner. This device greatly improves the resolution and feature scaling of next-generation chips by changing the optical design used to project printed images onto silicon wafers.This lithography equipment weighing 150 tons has been ...
μ Mesons are naturally occurring subatomic particles that can penetrate much deeper dense matter than X-rays. Therefore, μ Meson imaging can enable scientists to capture images of nuclear reactors, volcanoes, tsunamis, and hurricanes. However, this process is slow, as it occurs naturally μ The low flux of mesons requires several months of exposure time for the image.It is understood that ...
Recently, Deere Laser received mass production orders and bid confirmations for laser induced sintering (LIF) equipment from multiple top customers, with a cumulative production capacity exceeding 100GW.As an innovative technology iteratively developed by the company based on its own LIR technology and LIA technology, LIF technology has won industry recognition for its excellent efficiency improve...