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Summary:To filter out infrared light from the driving light source in the extreme ultraviolet lithography (EUVL) light source system, a rectangular grating structure needs to be fabricated on the surface of the collection mirror. However, the collection mirror grating usually undergoes deformation during the manufacturing process, resulting in a decrease in filtering efficiency. The process errors...
The team from the Photonic Systems Laboratory at the Federal Institute of Technology in Lausanne has developed a chip level laser source that can improve the performance of semiconductor lasers while generating shorter wavelengths.This groundbreaking work, led by Professor Camille Br è s and postdoctoral researcher Marco Clementi from the Federal Institute of Technology in Lausanne, represe...
Recently, a joint research team composed of Sun Meizhi, associate researcher of the High Power Laser Physics Joint Laboratory of the Chinese Academy of Sciences Shanghai Institute of Optics and Precision Mechanics, and Tu Xiaoniu, associate researcher of the Chinese Academy of Sciences Shanghai Institute of Silicate, proposed a new configuration of cross Fabry Perot intracavity optical parametric ...
Aerotech is a global leader in precision motion control and automation, and every release has made the Automation1 motion control platform even stronger and more user-friendly. Version 2.5 brings TCP socket interface (test version), Automation1 MachineApps HMI development, new auxiliary module for motor settings, and improved machine settings for galvanometer laser scanning heads.Automation1 conti...
The nanoelectronics research center IMEC from Belgium announced the successful completion of a significant trial: the fabrication of a 110GHz C-band GeSi electro-absorption modulator on a 300mm silicon photonics platform.Achieving a net data rate of 400Gb/s per lane and optimized for compactness, low latency, and high energy efficiency, imec says its modulator “establishes the foundation for next-...