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According to Korean media reports, Intel has acquired most of the high numerical aperture (NA) extreme ultraviolet (EUV) lithography equipment manufactured by ASML in the first half of next year.ASML plans to produce 5 high NA EUV lithography equipment this year, all of which will be supplied to Intel.They stated that ASML has an annual production capacity of approximately 5-6 High Numerical Apert...
A group of network, semiconductor, and optical companies formed the LPO MSA to develop the network equipment and optical module specifications required to implement a wide ecosystem of interoperable LPO solutions.These specifications address the industry challenges of reducing power consumption, cost, and latency while improving the reliability of high-speed optical interconnections.Accelink, AMD...
The time/frequency unit is the most accurate among the seven basic units, so many measurement studies that pursue ultra-high accuracy and sensitivity will be transformed into frequency measurements to achieve higher measurement accuracy and sensitivity. For example, by measuring the relative changes in the ratio of different atomic transition frequencies, ultralight dark matter can be detected or ...
Neptunium is the main radioactive component of nuclear waste, with a complex atomic structure that can be explored through mass spectrometry. This analysis is crucial for understanding its inherent characteristics and determining the isotopic composition of neptunium waste. Magdalena Kaja and her team from Johannes Gutenberg University in Mainz, Germany have developed a novel laser spectroscopy te...
The Chinese Academy of Sciences reduced the volume of the deep ultraviolet laser by 90% and achieved 193 nm vortex beam output for the first time. Professor Xuan Hongwen described "loading truck equipment into the car trunk". This technology enables a 30% reduction in the size of lithography features, breaking through the bottleneck of the 2-nanometer process. In the next three years, laser power ...