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Chip level ultrafast mode-locked laser based on nanophotonic lithium niobate.Researchers have created a compact mode-locked laser integrated into a nanophotonic platform, capable of generating high-power and ultrafast optical pulses. The breakthrough in miniaturization of MLL technology can significantly expand the application of photonics.Innovation in mode-locked laser technologyTo improve the t...
The Helmholtz Dresden Rosendorf Center (HZDR) has made significant progress in laser plasma acceleration. By adopting innovative methods, the research team successfully surpassed previous proton acceleration records significantly.They obtained energy for the first time that can only be achieved in larger facilities so far. As reported by the research team in the journal Nature Physics, promising a...
Chip giant Intel announced that it has completed the assembly work of the world's first commercial high numerical aperture (NA) extreme ultraviolet lithography (EUV) scanner. This device greatly improves the resolution and feature scaling of next-generation chips by changing the optical design used to project printed images onto silicon wafers.This lithography equipment weighing 150 tons has been ...
Scientists from Leibniz University in Hanover have pioneered the development of a new manufacturing technology - UV LED based microscopy projection lithography. This technology is expected to completely change the manufacturing method of optical components, providing high resolution at lower cost and ease of use. The MPP system utilizes the power of UV LED light sources to transcribe the structura...
Recently, teachers and students from the Institute of Solid State Laser and Ultrafast Photonics at the School of Physics and Optoelectronic Engineering have made significant progress in the study of ultrafast carrier dynamics in optoelectronic functional crystals. The related research results are titled "Anisotropic carrier dynamics and laser fabricated luminosity patterns on oriented single cryst...