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Recently, Hu Lili, a research group of the Advanced Laser and Optoelectronic Functional Materials Department of the Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, proposed a new scheme based on field strength optimization of Er doped silicate fiber as an extended L-band broadband amplifier. Relevant research achievements were published in Optics Letters under the tit...
Have you ever imagined finding exquisitely designed and vibrant buildings in an industrial park? The headquarters of Deutschengen in Germany is such a place that combines creativity and practicality.Carefully planned and focused sustainable architecture combines design and functionality, showcasing the best appearance of industrial architecture and a vivid practice of its corporate spirit and valu...
LLNL has long been a pioneer in the development of EUV lithography technology.A laboratory located in California will lay the foundation for the next development of extreme ultraviolet (EUV) lithography technology. The project is led by Lawrence Livermore National Laboratory (LLNL) and aims to promote the next development of EUV lithography technology, centered around the laboratory's developed dr...
The latest progress in X-ray laser technology has opened up a new era of nanoscale exploration, bringing unprecedented opportunities for materials science and nanotechnology. Researchers have developed a novel imaging technique that can directly visualize separated nanosamples in free flight, capturing their complex structures with stunning details. This breakthrough method relies on single cohere...
Recently, DustPhotonics released a single chip 800G-DR8 silicon photonic chip for data center applications, which is an important milestone in practical photonics in data centers. The company claims that its single-chip solution provides high-performance and easy to implement solutions for system architects.DustPhotonics' 800G-DR8 photonic integrated circuit provides a single chip solution for fib...