- No hay datos
Español
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
Engineer and inventor Ezequiel Pawelko is one of the creators of X Lidar, a laser technology that can detect volcanic ash in the atmosphere, draw safe flight paths, and maintain airport operations during volcanic eruptions. Nowadays, he is engaged in other applications such as detecting space debris, monitoring natural resources and fisheries, preventing fires, and drawing radiation and wind maps ...
According to a latest overseas market research report, it is expected that the global industrial laser system market size will reach approximately 32.2 billion US dollars by 2028, with a compound annual growth rate of 8.3% from 2023 to 2028.The future prospects of the global industrial laser system market are broad, with opportunities in numerous fields such as semiconductors and electronics, auto...
It is reported that researchers from Beijing University of Chemical Technology and BOE Technology Group Co., Ltd. have collaborated to develop a transparent organic-inorganic composite optical adhesive material with highly tunable refractive index. The related research paper was recently published in Engineering.In the early days, glass was the main raw material for optical components. In recent y...
Recently, Deere Laser received mass production orders and bid confirmations for laser induced sintering (LIF) equipment from multiple top customers, with a cumulative production capacity exceeding 100GW.As an innovative technology iteratively developed by the company based on its own LIR technology and LIA technology, LIF technology has won industry recognition for its excellent efficiency improve...
LLNL has long been a pioneer in the development of EUV lithography technology.A laboratory located in California will lay the foundation for the next development of extreme ultraviolet (EUV) lithography technology. The project is led by Lawrence Livermore National Laboratory (LLNL) and aims to promote the next development of EUV lithography technology, centered around the laboratory's developed dr...