- No hay datos
Español
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
Recently, the High Power Laser Unit Technology Laboratory of Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, has made progress in research on high efficiency supercontinuum in specific bands. The relevant research results were published in the Journal of Lightwave Technology under the title of "Strong Anti Stokes and flat supercontinuum in specified band based on non ...
On February 11th, global industrial fiber laser giant IPG Photonics announced its financial performance for the fourth quarter and full year of 2024. Annual sales have fallen below the $1 billion mark for the first time, with a year-on-year decline of 24% and a pre tax loss of up to $162 million. As an industry leader, IPG's financial report not only reflects the deep adjustment faced by the ind...
Organic polymer semiconductor materials, due to their unique molecular structure and weak van der Waals interactions, are endowed with the characteristics of soluble processing and easy flexibility, and have potential applications in portable and implantable medical monitoring devices. A highly flexible, skin conformal, and excellent spatial resolution X-ray detector is expected to be integrated w...
The transmission of electromagnetic waves (such as lasers) in plasma is a fundamental issue in plasma physics. In general, electromagnetic waves cannot be transmitted in high-density plasma, but their transmission and energy transfer play a crucial role in applications such as fast ignition laser fusion, laser particle acceleration, and ultra short and ultra bright radiation sources.In 1996, S. fr...
LLNL has long been a pioneer in the development of EUV lithography technology.A laboratory located in California will lay the foundation for the next development of extreme ultraviolet (EUV) lithography technology. The project is led by Lawrence Livermore National Laboratory (LLNL) and aims to promote the next development of EUV lithography technology, centered around the laboratory's developed dr...