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Recently, four research groups from the University of Science and Technology of China, namely Yao Hongbin, Fan Fengjia, Lin Yue, and Hu Wei, have collaborated to make significant progress in the field of pure red perovskite light-emitting diodes (LEDs). The team independently invented the Electrical Excitation Transient Spectroscopy (EETA) technology and used it to reveal that hole leakage is the ...
A research team in Japan has designed a flexible and shapable X-ray reflector, achieving significant accuracy and higher stability at the atomic level.This new technology, developed by Satoshi Matsuyama and Takato Inoue from the Graduate School of Engineering at Nagoya University, in collaboration with the Japanese Institute of Physical and Chemical Research and JTEC Corporation, improves the perf...
EV Group, a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology, and semiconductor markets, and Silicon Austria Labs, a leading electronic systems research center in Austria, announced that SAL has received and installed multiple EVG lithography and photoresist processing systems in its MicroFab at the R&D cleanroom facility in Filach, Austria.These devices...
LLNL has long been a pioneer in the development of EUV lithography technology.A laboratory located in California will lay the foundation for the next development of extreme ultraviolet (EUV) lithography technology. The project is led by Lawrence Livermore National Laboratory (LLNL) and aims to promote the next development of EUV lithography technology, centered around the laboratory's developed dr...
When running various artificial intelligence programs such as large language models, although data centers and high-performance computers are not limited by the computing power of their individual nodes, the amount of data transmitted between nodes is currently the root cause of the limitations on the performance and bandwidth transmission of these systems.Because some nodes in the system are more...