- Δεν υπάρχουν δεδομένα
Ελληνικά
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
STMicroelectronics (ST), a developer of semiconductor technologies and Metalenz, which creates metasurface optics, have announced a new license agreement.The companies intend to broaden ST’s capability to use Metalenz IP to produce advanced metasurface optics based on ST’s manufacturing platform combining 300mm semiconductor and optics production, test and qualification. (Any) fiancial details of ...
In the fields of optics and micro/nano processing, precise manipulation of lasers to meet the growing demand for miniaturization is an important challenge in driving the development of modern electronic and biomedical equipment. Recently, researchers from Tohoku University in Japan successfully demonstrated the use of interference technology to enhance the longitudinal electric field of radially p...
Through joint research, a team developed a 4-amino-TEMPO derivative with photocatalytic performance and successfully used it to produce high-performance and stable fiber like dye sensitized solar cells (FDSSCs) and fiber like organic light-emitting diodes (FOLEDs). This paper was published in the journal Materials and Energy Today.The developed 4-amino-TEMPO derivatives have the characteristic of ...
Recently, Professor Xu Tingfa's research team from the School of Optoelectronics at Beijing Institute of Technology and Assistant Professor Lin Xing's team from Tsinghua University jointly developed a new type of Opto Intelligence Spectrometer (OIS). The device is based on diffractive neural network technology and achieves precise spectral reconstruction under spatially coherent or spatially incoh...
Recently, according to Tom's Hardware, Lawrence Livermore National Laboratory (LLNL) in the United States is developing a PW (1015 W) level large aperture thulium (BAT) laser. It is reported that this laser has the ability to increase the efficiency of extreme ultraviolet lithography (EUV) light sources by about 10 times, and may potentially replace the carbon dioxide laser used in current EUV too...