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Every year, Shanghai is lit up with a “feast of light”, that is LASER World of PHOTONICS CHINA, which has lasted for 20 years and become an arena for global photoelectric enterprises to display and compete, instead of just an exhibition hall of devices. Chanelink team visited all these halls for laser technology, thoroughly learning the cutting-edge trends in photoelectric industry.As a technical...
Recently, according to Tom's Hardware, Lawrence Livermore National Laboratory (LLNL) in the United States is developing a PW (1015 W) level large aperture thulium (BAT) laser. It is reported that this laser has the ability to increase the efficiency of extreme ultraviolet lithography (EUV) light sources by about 10 times, and may potentially replace the carbon dioxide laser used in current EUV too...
Recently, DE&T, a South Korean manufacturer of secondary batteries and display laser equipment, announced that the company will further expand its overseas business by opening new subsidiaries in the United States and Canada. According to its claim, this move is to carry out maintenance services for laser equipment locally. As of now, DE&T's overseas subsidiaries have increased from two to...
On December 11th local time, New York State announced a partnership with companies such as IBM, Micron, Applied Materials, and Tokyo Electronics to jointly invest $10 billion to expand the Albany NanoTech Complex in New York State, ultimately transforming it into a high numerical aperture extreme ultraviolet (NA EUV) lithography center to support the development of the world's most complex and pow...
The researchers estimate the period from 2023 to 2028. EUV lithography will address the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the manufacture of advanced microchips with greater transistor densities....