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Lithography is one of the core processes in semiconductor manufacturing, and extreme ultraviolet lithography technology, as a new generation lithography technology, is also in a rapid development stage. The basic principle is to use photoresist (also known as photoresist) to form corrosion resistance due to photochemical reactions after being photosensitive, and to engrave the patterns on the mask...
A team of researchers in Berkeley Lab's Accelerator Technology and Applied Physics (ATAP) division has developed a new technique that combines fiber lasers of different wavelengths to generate ultra-short laser pulses. The research is in the journal Optics Letters.This work could advance the development of laser plasma accelerators (LPA), which have the potential to push the frontiers of high-en...
Lithography machine is the key equipment for making high precision mask plate. Using a very fine laser beam, the highly precise line pattern is drawn on the mask substrate under the control of an extremely precise automatic control system.Laser direct writing is to use a laser beam with variable intensity to implement variable dose exposure on the resist material (photoresist) on the subst...
Dr. Yongcui Mi from Western University in Sweden has developed a new technology that enables real-time laser beam shaping and control for laser welding and directional energy deposition using laser and metal wire. This innovative technology draws on the mirror technology used in advanced astronomical telescopes.Adaptive beam shaping using deformable mirror technology (Image source: Western Univer...
When running various artificial intelligence programs such as large language models, although data centers and high-performance computers are not limited by the computing power of their individual nodes, the amount of data transmitted between nodes is currently the root cause of the limitations on the performance and bandwidth transmission of these systems.Because some nodes in the system are more...