Deutsch

Changing Optical Design: How Multi scale Simulation Improves the Efficiency of Modern Devices

480
2024-03-02 11:59:05
Übersetzung anzeigen

Optical equipment is an integral part of technologies such as data centers and autonomous vehicle, which are constantly developing to meet the needs of complex applications. The challenge faced by designers is to manipulate light at the wavelength scale to achieve the required optical properties, which requires precision at both the nano and macro scales. Nanoscale structures, such as those on LEDs, improve efficiency through photonic crystals and require designers to perform high-precision simulations at different scales.

In 2021, Ansys' acquisition of Zemax marked an important step in addressing the challenges of optical device design. This merger combines Zemax's OpticStudio with Ansys's integrated platform, which is renowned for analyzing light interactions greater than wavelength. This platform enables designers to conduct visual simulations from the nanoscale to the system level, ensuring the efficiency and accuracy of developing modern optical systems.

Ansys Lumerical simulates the interaction between light and wavelength scale structures by solving Maxwell's equations, which is a key function in designing efficient nanostructures on LEDs. Meanwhile, Ansys Speos provides system level visualization and validation, integrating human visual acuity into simulations. This is particularly important for applications such as car headlights and AR/VR head mounted devices, where understanding human perception can greatly reduce the need for expensive physical prototypes.

The integration of OpticStudio, Lumerical, and Speos on the Ansys platform represents a leap in optical design and simulation. Nowadays, design engineers can use multi physical fields and multi-scale simulation toolkits to develop optical products with unprecedented efficiency and accuracy. This progress demonstrates our continuous efforts to provide seamless and user-friendly interfaces to connect these complex solutions, enabling engineers to quickly bring innovative optical systems to the market.

The collaboration between Ansys and Zemax is backed by cutting-edge simulation technology, setting new standards for the design and modeling of modern optical devices. By implementing full spectrum simulation from nanostructures to system level applications, this platform not only improves the efficiency and performance of optical devices, but also drives innovation in fields that heavily rely on advanced optical technology.

Source: Laser Net

Ähnliche Empfehlungen
  • Fulu and Longview begin design work on laser melting devices

    Longview Fusion Energy Systems and Fluor have taken another step towards commercialization of laser fusion power plants.According to the memorandum of understanding signed by the two companies, Fulu will design the factory for Longview Fusion Energy Systems. The two companies collaborated and signed a memorandum of understanding in 2023 to leverage Fulu's experience in developing and constructing ...

    2024-03-13
    Übersetzung anzeigen
  • Showcasing the world's fastest photonics alignment system for SiPh chips on Photonics West

    With its proprietary fast multi-channel photon alignment algorithm and professional high-precision machinery, PI helps customers improve production efficiency to participate in the rapidly growing silicon photonics market. Over the past decade, PI has been continuously expanding its range of automatic photon alignment engines and will launch new systems at both ends of the spectrum in this year's ...

    2024-01-19
    Übersetzung anzeigen
  • HGTECH Laser's New Product Debuts at the 2025 Munich Shanghai Light Expo

    New Product for Wafer Testing Probe Card Manufacturing Equipment Project This project adopts vision guided laser precision cutting to separate the probe from the crystal disk, and then generate a product mapping image for use in the next process. When picking up the probe, multi-point reference surface fitting technology is used to achieve non-contact probe suction and avoid force deformation. A...

    03-07
    Übersetzung anzeigen
  • EO Technologies from South Korea enters the glass substrate processing market

    Recently, EO Technologies, a well-known semiconductor laser processing equipment manufacturer in South Korea, is emerging in the glass substrate processing market.It is understood that EO Technologies is entering the glass substrate TGV market based on its UV laser drilling equipment originally used in PCB substrate technology. TGV technology is the core process for drilling holes inside glass sub...

    2024-06-18
    Übersetzung anzeigen
  • Historic Moment! The 100th TruLaser Cell Series 3D Five-Axis Laser Cutting Machine Successfully Rolls Off the Production Line in China

    Driven by the global trend of lightweighting in new energy vehicles (NEVs), TRUMPF has reached a significant milestone in Taicang, Jiangsu—the successful rollout of the 100th TruLaser Cell series 3D five-axis laser cutting machine. This achievement is more than just a numerical breakthrough; it symbolizes the deep integration of German technology with Chinese manufacturing and underscores TRUMPF's...

    03-14
    Übersetzung anzeigen